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INTERNATIONAL PATENT: NTT DOCOMO, INC., 株式会社NTTドコモ FILES APPLICATION FOR "TERMINAL, WIRELESS COMMUNICATION METHOD AND BASE STATION"

GENEVA, April 28 -- NTT DOCOMO, INC. (11-1,Nagatacho 2-chome, Chiyoda-ku, Tokyo1006150), 株式会社NTTドコモ (東京都&#213... Read More


INTERNATIONAL PATENT: JAPAN DISPLAY INC., 株式会社ジャパンディスプレイ FILES APPLICATION FOR "DRIVING METHOD FOR RADIO WAVE REFLECTING DEVICE"

GENEVA, April 28 -- JAPAN DISPLAY INC. (3-7-1 Nishi-shinbashi, Minato-ku, Tokyo1050003), 株式会社ジャパンディスプレ&#12452... Read More


INTERNATIONAL PATENT: NTT DOCOMO, INC., 株式会社NTTドコモ FILES APPLICATION FOR "TERMINAL, WIRELESS COMMUNICATION METHOD AND BASE STATION"

GENEVA, April 28 -- NTT DOCOMO, INC. (11-1,Nagatacho 2-chome, Chiyoda-ku, Tokyo1006150), 株式会社NTTドコモ (東京都&#213... Read More


INTERNATIONAL PATENT: KABUSHIKI KAISHA TOSHIBA, 株式会社 東芝, TOSHIBA ENERGY SYSTEMS & SOLUTIONS CORPORATION, 東芝エネルギーシステムズ株式会社 FILES APPLICATION FOR "STATOR CORE SUPPORT STRUCTURE AND ROTATING ELECTRICAL MACHINE"

GENEVA, April 28 -- KABUSHIKI KAISHA TOSHIBA (72-34, Horikawa-cho, Saiwai-ku, Kawasaki-shi, Kanagawa2120013), 株式会社 東芝 (神奈川県... Read More


INTERNATIONAL PATENT: NIKON-ESSILOR CO.,LTD., 株式会社ニコン・エシロール FILES APPLICATION FOR "OPTICAL ARTICLE"

GENEVA, April 28 -- NIKON-ESSILOR CO.,LTD. (10-8, Ryogoku 2-chome, Sumida-ku, Tokyo1300026), 株式会社ニコン・エシロール (&... Read More


INTERNATIONAL PATENT: NGK CORPORATION, NGK株式会社 FILES APPLICATION FOR "SUBSTRATE SET, SINGLE CRYSTAL SUBSTRATE, METHOD FOR PRODUCING SUBSTRATE SET AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT"

GENEVA, April 28 -- NGK CORPORATION (2-56 Suda-cho, Mizuho-ku, Nagoya-shi, Aichi4678530), NGK株式会社 (愛知県名古屋&#24... Read More


INTERNATIONAL PATENT: HORIBA STEC, CO., LTD., 株式会社堀場エステック FILES APPLICATION FOR "FLUID CONTROL DEVICE AND FLUID MIXING DEVICE"

GENEVA, April 28 -- HORIBA STEC, CO., LTD. (11-5, Hokotate-cho, Kamitoba, Minami-ku, Kyoto-shi, Kyoto6018116), 株式会社堀場エステック ... Read More


INTERNATIONAL PATENT: NISSAN CHEMICAL CORPORATION, 日産化学株式会社 FILES APPLICATION FOR "METHOD FOR MANUFACTURING WIRING BOARD"

GENEVA, April 28 -- NISSAN CHEMICAL CORPORATION (5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo1036119), 日産化学株式会社 (東京都中&#22... Read More


INTERNATIONAL PATENT: JSR CORPORATION, JSR株式会社 FILES APPLICATION FOR "RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, ONIUM SALT COMPOUND AND POLYMER"

GENEVA, April 28 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), JSR株式会社 (東京都港区&#26481... Read More


INTERNATIONAL PATENT: TOSOH CORPORATION, 東ソー株式会社 FILES APPLICATION FOR "MODIFIED T7 RNA POLYMERASE"

GENEVA, April 28 -- TOSOH CORPORATION (4560, Kaisei-cho, Shunan-shi, Yamaguchi7468501), 東ソー株式会社 (山口県周南市&#3828... Read More